History of Science and Engineering Annotation << Back RESEARCH AND DEVELOPMENT IN THE FIELD OF MICROAND NANOSYSTEMS V.F. Lukichev, I.I. Amirov The article presents the main results of scientifi c and organizational activities in the fi eld of development of plasma technologies for the formation of high-aspect microstructures in silicon and the creation of modern specialized domestic technological equipment for deep anisotropic plasma-chemical etching of silicon. On the basis of fundamental research, technologies were developed, designs and technological routes for the manufacture of products of microsystem equipment of a new generation of inertial control systems were created. Keywords: plasma; micro and nanostructures; silicon; plasmochemical etching. DOI: 10.25791/intstg.08.2018.109 Contacts: Е-mail: lukichev@ftian.ru Pp. 92-99.